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Thin-Films–Stresses and Mechanical Properties VII

Thin-Films–Stresses and Mechanical Properties VII

Thin-Films–Stresses and Mechanical Properties VII

Volume 505:
Robert C. Cammarata, Naval Research Laboratory, Washington
Michael Nastasi, Los Alamos National Laboratory
Estaban P. Busso, Imperial College London
Warren C. Oliver, Nano Instruments, Inc., Tennessee
August 1998
505
Hardback
9781558994102
Hardback

    Mechanical behavior in thin films continues to be a growing field of interest in the materials research community. This behavior can critically influence the design, performance and reliability of thin-film structures used in every area of thin-film technology. Examples of affected areas include semiconductor and magnetic recording technology, as well as protective and hard-coating technology. As a result, it is important to study fundamental issues involved in film-substrate adhesion, the development of intrinsic stresses and the mechanisms of plastic deformation, strain relaxation, and fracture in thin films. This book addresses issues towards improving existing, as well as developing new, mechanical property characterization techniques such as more sensitive ultrasonic methods for elastic behavior determination and low-load indentation methods to investigate yield, creep, and fracture behavior. Experimental, theoretical and modelling work is presented. Topics include: novel testing methods; low-load indentation; metallization and reliability; structural and mechanical stability; surface and tribological properties; adhesion; deformation mechanisms; stresses in thin films - generation mechanisms and measurement techniques; multilayered and superlattice thin films and structure/property/processing relationships.

    Product details

    August 1998
    Hardback
    9781558994102
    646 pages
    1.068kg
    Out of stock in print form with no current plan to reprint
      Editors
    • Robert C. Cammarata , Naval Research Laboratory, Washington
    • Michael Nastasi , Los Alamos National Laboratory
    • Estaban P. Busso , Imperial College London
    • Warren C. Oliver , Nano Instruments, Inc., Tennessee