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Thin Films – Stresses and Mechanical Properties VIII

Thin Films – Stresses and Mechanical Properties VIII

Thin Films – Stresses and Mechanical Properties VIII

Volume 594:
Richard Vinci, Lehigh University, Pennsylvania
Oliver Kraft, Max-Planck-Institut für Metallforschung, Germany
Neville Moody, Sandia National Laboratories, California
Paul Besser, AMD-Motorola Alliance Logic Technology, U.S.A.
Edward Shaffer, II, Dow Chemical Company, Michigan
June 2014
594
Unavailable - out of print
Paperback
9781107413306
Out of Print
Paperback
Hardback

    An understanding of mechanical behavior is crucial for a wide variety of thin-film technologies such as semiconductor devices and packaging (including advanced interconnects, dielectrics and silicides), information storage media, hard coatings, microelectromechanical systems (MEMS), and biomedical devices. The influence of mechanical behavior is seen in thin-film performance and reliability, as well as morphology development during processing and service. The increased need for understanding of these properties has challenged modern materials science because concepts, models and techniques developed for bulk materials often do not apply in small dimensions. This book addresses key issues in the still growing field of thin-film mechanical behavior. Topics include: multilayer thin films; metallic thin films; epitaxy, deposition parameters, microstructure and stresses; thin films for applications in MEMS; polymer thin films; mechanical properties of amorphous and crystalline carbon; adhesion and fracture; reliability in microelectronics; and nanoindentation and advanced testing techniques.

    Product details

    June 2014
    Paperback
    9781107413306
    566 pages
    229 × 152 × 29 mm
    0.75kg
    Unavailable - out of print
      Editors
    • Richard Vinci , Lehigh University, Pennsylvania
    • Oliver Kraft , Max-Planck-Institut für Metallforschung, Germany
    • Neville Moody , Sandia National Laboratories, California
    • Paul Besser , AMD-Motorola Alliance Logic Technology, U.S.A.
    • Edward Shaffer, II , Dow Chemical Company, Michigan