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Film Synthesis and Growth using Energetic Beams

Film Synthesis and Growth using Energetic Beams

Film Synthesis and Growth using Energetic Beams

Volume 388:
H. A. Atwater, California Institute of Technology
J. T. Dickinson, Washington State University
D. H. Lowndes, Oak Ridge National Laboratory
A. Polman, FOM-Institute for Atomic and Molecular Physics Amsterdam
October 1995
388
Out of stock in print form with no current plan to reprint
Hardback
9781558992917
£22.99
GBP
Hardback

    With over 16 countries represented, this book represents international developments in the field of film synthesis and growth using energetic beams. It focuses on pulsed-laser deposition. Fundamental issues pertaining to the generation of laser ablation plumes, temperature distributions and collisional effects are described. Ion-assisted pulsed-laser deposition, pulsed-ion deposition, applications of hyperthermal beams and aspects of surface dynamics are discussed. The inclusion of an ion beam with the ablation process leads to some unique modifications in the thin-film growth mechanisms, and hence, film properties. Likewise, the collision of high-mass metal cluster ions with substrates shows promise for growth of novel structures. Also featured are new developments of optoelectronic materials, nitrides and carbon films using a variety of techniques. The effects of beam-induced defects on growth and surface morphology, chemical effects during growth, and characterization of film growth and film properties are addressed.

    Product details

    October 1995
    Hardback
    9781558992917
    446 pages
    0.773kg
    Out of stock in print form with no current plan to reprint
      Editors
    • H. A. Atwater , California Institute of Technology
    • J. T. Dickinson , Washington State University
    • D. H. Lowndes , Oak Ridge National Laboratory
    • A. Polman , FOM-Institute for Atomic and Molecular Physics Amsterdam