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Diffusion Mechanisms in Crystalline Materials

Diffusion Mechanisms in Crystalline Materials

Diffusion Mechanisms in Crystalline Materials

Volume 527:
Yuri Mishin, Virginia Polytechnic Institute and State University
Gero Vogl, University of Vienna, Vienna, Austria
Nicholas Cowern, Philips Research Laboratories, The Netherlands
Richard Catlow, Royal Institution of Great Britain, London
Diana Farkas, Virginia Polytechnic Institute and State University
June 2014
527
August 1998
Out of stock in print form with no current plan to reprint
Paperback
9781107413689
$35.99
USD
Paperback
USD
Hardback

    Solid-state diffusion often controls the evolution of the structure and properties of engineering materials, during both processing and the working lifetime of the engineered product. Diffusion characteristics of crystalline materials are critical for the manufacturing and operation of an enormous range of advanced products, from microelectronic devices to gas turbine blades. Many fundamental diffusion data issues remain unresolved. This book focuses on experimental and simulation techniques that provide access to atomic-scale mechanisms of diffusion in different classes of crystalline materials. Recent advances in the understanding of microscopic mechanisms of diffusion are reviewed and future research directions are discussed. More importantly, the book features an exchange of ideas among the communities of diffusion scientists working with metals and metallic alloys, intermetallic compounds, semiconductors, ceramics and ionic materials. Topics include: diffusion mechanisms in metals and alloys; diffusion in intermetallic compounds; grain boundary and surface diffusion - diffusion in quasicrystals; diffusion in semiconductors; and diffusion in ionic conductivity and ionic materials.

    Product details

    June 2014
    August 1998
    Paperback
    9781107413689
    566 pages
    229 × 152 × 29 mm
    0.74kg
    Out of stock in print form with no current plan to reprint
      Editors
    • Yuri Mishin , Virginia Polytechnic Institute and State University
    • Gero Vogl , University of Vienna, Vienna, Austria
    • Nicholas Cowern , Philips Research Laboratories, The Netherlands
    • Richard Catlow , Royal Institution of Great Britain, London
    • Diana Farkas , Virginia Polytechnic Institute and State University