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GaN, AIN, InN and their Alloys

GaN, AIN, InN and their Alloys

GaN, AIN, InN and their Alloys

Volume 831:
Christian Wetzel, Rensselaer Polytechnic Institute, New York
Bernard Gil, Université de Montpellier II
Masaaki Kuzuhara, Fukui University, Japan
Michael Manfra, Bell Laboratories, New Jersey
July 2005
831
Out of stock in print form with no current plan to reprint
Hardback
9781558997790
$37.99
USD
Hardback
Paperback

    This book discusses GaN and Related Alloys and reflects an emerging emphasis on the binaries of InN and AlN. The major thrust here is the topical development of thin-film growth, bulk growth techniques, methods to cover the full ternary and quaternary alloy ranges toward InN and AlN and their characterization; strategies for structural defect reduction and their characterization; ways to better control p-type doping and its characterization; device and defect physics, including polarization effects; physics of surfaces and interfaces; and device processing techniques. In addition, advances in MBE devices, high-power electronics, RF performance of electronics, UV emitters, high-efficiency light emitters, photo and chemical sensors, as well as new applications within the group-III nitrides, are also covered. The book captures the current status of this field and will be useful for researchers working with group-III nitrides, as well as for students who seek entry into this subject.

    Product details

    July 2005
    Hardback
    9781558997790
    784 pages
    228 × 152 mm
    1.159kg
    Out of stock in print form with no current plan to reprint
      Editors
    • Christian Wetzel , Rensselaer Polytechnic Institute, New York
    • Bernard Gil , Université de Montpellier II
    • Masaaki Kuzuhara , Fukui University, Japan
    • Michael Manfra , Bell Laboratories, New Jersey