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Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices – 1999

Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices – 1999

Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices – 1999

Volume 557:
Howard M. Branz, National Renewable Energy Laboratory, Golden, Colorado
Robert W. Collins, Pennsylvania State University
Hiroaki Okamoto, University of Osaka, Japan
Subhendu Guha, United Solar Systems Corp., Michigan
Ruud Schropp, Universiteit Utrecht, The Netherlands
June 2014
557
December 1999
Unavailable - out of print
Paperback
9781107413931
Out of Print
Paperback
USD
Hardback

    Applications requiring large-area semiconductor coverage rely increasingly on amorphous and heterogeneous silicon materials because they can be deposited at low cost on a variety of substrates. This volume, first published in 1999, covers the range from fundamental research to the device applications of these materials. A special session on medium-range order is featured, and confirms the belief that ordering correlates with the electronic quality of a-Si:H films. Important experimental observations on metastable effects in a-Si:H are also reported, as are devices and processing strategies. Topics include: growth and properties; high-rate deposition; recrystallization, amorphization and porous silicon; ordering and hydrogen; metastability; defects, band tails and transport; heterogeneous materials and devices; thin-film transistors and displays; solar cells; and detectors, imagers and other devices.

    Product details

    June 2014
    December 1999
    Paperback
    9781107413931
    912 pages
    229 × 152 × 46 mm
    1.2kg
    Unavailable - out of print
      Editors
    • Howard M. Branz , National Renewable Energy Laboratory, Golden, Colorado
    • Robert W. Collins , Pennsylvania State University
    • Hiroaki Okamoto , University of Osaka, Japan
    • Subhendu Guha , United Solar Systems Corp., Michigan
    • Ruud Schropp , Universiteit Utrecht, The Netherlands