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Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing

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Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing

Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing

Volume 146:
David Hodul, Varian Research Center, Palo Alto, California
Jeffrey C. Gelpey, Peak Systems, Inc., Saugus, Massachusetts
Martin L. Green, AT&T Bell Laboratories, New Jersey
Thomas E. Seidel, Sematech, Austin, Texas
June 2014
146
November 1989
Paperback
9781107410756
Out of Print
Paperback
USD
Hardback
    Description

    Product details

    November 1989
    Hardback
    9781558990197
    520 pages
    229 × 29 × 152 mm
    0.86kg
    Temporarily unavailable - available from TBC

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      Editors
    • David Hodul , Varian Research Center, Palo Alto, California
    • Jeffrey C. Gelpey , Peak Systems, Inc., Saugus, Massachusetts
    • Martin L. Green , AT&T Bell Laboratories, New Jersey
    • Thomas E. Seidel , Sematech, Austin, Texas

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