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Advances in Spectroscopy and Imaging of Surfaces and Nanostructures

Advances in Spectroscopy and Imaging of Surfaces and Nanostructures

Advances in Spectroscopy and Imaging of Surfaces and Nanostructures

Volume 1318:
John Cumings, University of Maryland
Dillon D. Fong, Argonne National Laboratory, Illinois
Jianyu Huang, Sandia National Laboratories
Stuart Lindsay, Arizona State University
Guangwen Zhou, State University of New York, Binghamton
Jinghua Guo, Lawrence Berkeley National Laboratory
Hendrik Bluhm, Lawrence Berkeley National Laboratory
Michael Hävecker, Fritz Haber Institute of the Max Planck Society
Shu Yamaguchi, University of Tokyo
Gertjan Koster, University of Twente, Enschede, The Netherlands
Fabio Miletto Granozio, Università degli Studi di Napoli 'Federico II'
Gyula Eres, Oak Ridge National Laboratory
Chang-Beom Eom, University of Wisconsin, Madison
Nicholas Ingle, University of British Columbia, Vancouver
Oleg V. Kolosov, Lancaster University
Bryan D. Huey, University of Connecticut
Seungbum Hong, Argonne National Laboratory, Illinois
Hyunjung Shin, Kookmin University, South Korea
November 2011
1318
Unavailable - out of print
Hardback
9781605112954
Out of Print
Hardback

    Symposium SS, 'Advanced Imaging and Scattering Techniques for In Situ Studies', Symposium TT, 'In Situ X-Ray Synchrotron Radiation Spectroscopies in Energy-Related Materials Science and Heterogeneous Catalysis', Symposium UU, 'Real-Time Studies of Evolving Thin Films and Interfaces' and Symposium VV, 'Novel Development and Applications of Scanning Probe Microscopy', were held at the 2010 MRS Fall Meeting in Boston, Massachusetts. A major unifying theme for these symposia is exploration of intricate properties of materials on the near-to-atomic length scale in the immediate vicinity of the free surface or at interfaces between materials. These symposia focus on various aspects and approaches of exploration of surfaces and interfaces from more traditional electron and x-ray scattering (the focus of Symposia SS, TT and UU) to more recent and rapidly advancing scanning probe microscopy, or SPM (Symposium VV). Together, they cover a field of great importance across the broad MRS community.

    Product details

    November 2011
    Hardback
    9781605112954
    220 pages
    235 × 158 × 19 mm
    0.47kg
    127 b/w illus. 4 tables
    Unavailable - out of print

    Table of Contents

    • Part I. Advanced Imaging and Scattering Techniques for In Situ Studies:
    • 1. In situ imaging at the NIST neutron imaging facility David Jacobson
    • 2. Low energy Ne scattering spectroscopy for insulators, and materials in the electric/magnetic fields Kenji Umezawa
    • 3. Electron phase microscopy of magnetic fields in ferromagnets and superconductors Akira Tonomura
    • 4. Effect of oxygen pressure on the initial oxidation behavior of Cu and Cu-Au alloys Guangwen Zhou
    • 5. Automated crystallite orientation and phase mapping in the transmission electron microscope Peter Moeck
    • Part II. In Situ X-Ray Synchrotron Radiation Spectroscopies in Energy-Related Materials Science and Heterogeneous Catalysis:
    • 6. Electronic structures of non-Pt carbon alloy catalysts for polymer electrolyte membrane fuel cells revealed by synchrotron radiation analyses Masaharu Oshima
    • 7. Quantum rods and dots-based structures and devices: low cost aqueous synthesis and bandgap engineering for solar hydrogen and solar cells applications Lionel Vayssieres
    • Part III. Real-Time Studies of Evolving Thin Films and Interfaces:
    • 8. Formation of irregular Al islands by room-temperature deposition on NiAl(110) Jim Evans
    • 9. In-situ TEM observation of formation-retraction-fracture experiment of liquid-like silicon nanocontact Tadashi Ishida
    • 10. Observation of real-time thin film evolution using microcantilever sensors Alan Schilowitz
    • 11. X-ray study of strained and strain balanced superlattice materials Natee Johnson
    • 12. In-situ XRD and FIB microscopy studies of the dynamics of intermetallic phase formation in thin layer Cu/Sn films for low-temperature isothermal diffusion soldering Harald Etschmaier
    • 13. Stochastic models of epitaxial growth Dionisios Margetis
    • 14. Characterisation of organic semiconductor growth using real-time electron spectroscopy Andrew Evans
    • 15. The electrical conduction at early stages of cluster-assembled films growth Emanuele Barborini
    • 16. Spreading kinetics at a molecular level Jean-Luc Buraud
    • Part IV. Real-Time Studies of Evolving Thin Films and Interfaces:
    • 17. Multiparameter imaging and understanding the role of the tip – atomic resolution images of rutile TiO2 (110) John Pethica
    • 18. Experimental and theoretical study of the new image force microscopy principle H. Kumar Wickramasinghe
    • 19. Crystallographic processing of scanning tunneling microscopy images of cobalt phthalocyanines on silver and graphite Peter Moeck
    • 20. Scanning thermal lithography as a tool for highly localized nanoscale chemical surface functionalization Joost Duvigneau
    • 21. Digital pulsed force mode AFM and confocal Raman microscopy in drug-eluting coatings research Greg Haugstad
    • 22. Measurement of piezoelectric transverse and longitudinal displacement with atomic force microscopy for PZT thick films Yuta Kashiwagi
    • 23. Circular AFM mode: a new AFM mode for investigating surface properties Olivier Noel
    • 24. Scanning probe microscopy with diamond tip in tribo-nanolithography Oleg Lysenko
    • 25. Photoinduced temporal change of surface-potential undulation on Alq3 thin films observed by Kelvin probe force microscopy Kazunari Ozasa
    • 26. Atomic force microscopy based quantitative mapping of elastic moduli in phase separated polyurethanes and silica reinforced rubbers across the length scales Peter Schoen
    • 27. In situ chemical functionalization of a single carbon nanotube functionalized AFM tip using a correlated optical and atomic force microscope Katherine Willets.
      Contributors
    • David Jacobson, Kenji Umezawa, Akira Tonomura, Guangwen Zhou, Peter Moeck, Masaharu Oshima, Lionel Vayssieres, Jim Evans, Tadashi Ishida, Alan Schilowitz, Natee Johnson, Harald Etschmaier, Dionisios Margetis, Andrew Evans, Emanuele Barborini, Jean-Luc Buraud, John Pethica, H. Kumar Wickramasinghe, Peter Moeck, Joost Duvigneau, Greg Haugstad, Yuta Kashiwagi, Olivier Noel, Oleg Lysenko, Kazunari Ozasa, Peter Schoen, Katherine Willets

    • Editors
    • John Cumings , University of Maryland
    • Dillon D. Fong , Argonne National Laboratory, Illinois
    • Jianyu Huang , Sandia National Laboratories
    • Stuart Lindsay , Arizona State University
    • Guangwen Zhou , State University of New York, Binghamton
    • Jinghua Guo , Lawrence Berkeley National Laboratory
    • Hendrik Bluhm , Lawrence Berkeley National Laboratory
    • Michael Hävecker , Fritz Haber Institute of the Max Planck Society
    • Shu Yamaguchi , University of Tokyo
    • Gertjan Koster , University of Twente, Enschede, The Netherlands
    • Fabio Miletto Granozio , Università degli Studi di Napoli 'Federico II'
    • Gyula Eres , Oak Ridge National Laboratory
    • Chang-Beom Eom , University of Wisconsin, Madison
    • Nicholas Ingle , University of British Columbia, Vancouver
    • Oleg V. Kolosov , Lancaster University
    • Bryan D. Huey , University of Connecticut
    • Seungbum Hong , Argonne National Laboratory, Illinois
    • Hyunjung Shin , Kookmin University, South Korea