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GaN and Related Alloys – 2001

GaN and Related Alloys – 2001

GaN and Related Alloys – 2001

Volume 693:
John E. Northrup, Palo Alto Research Center, California
Jörg Neugebauer, Fritz-Haber-Institut der Max-Planck-Gesellschaft
David C. Look, Wright State University, Ohio
Shigefusa F. Chichibu, University of Tsukuba, Japan
Henning Riechert, Infineon Technologies
No date available
693
Paperback
9781107412071
Paperback

    This book focuses on three main themes. Theme one - advances in basic science. Point defects, dislocations, doping, the properties of nitride alloys with a special emphasis on localization phenomena and GaAsN alloys (which are very promising for long-wavelength emitters), transport and optical properties are also featured. Theme two - growth and growth-related issues. Significant advances have been made in understanding/improving all major nitride growth techniques (MBE, MOCVD, HVPE). Techniques such as ELOG and the development of bulk-like substrates are receiving attention as methods to reduce the number of dislocations. Theme three - devices. Tremendous progress has been reported in device design and optimization, and also in understanding device processing issues such as p-contacts, laser lift-off, and etching. Overall, the book offers a broad exchange of scientific knowledge and technical expertise. Topics include: molecular beam epitaxy and growth kinetics; point defects and doping; light emitters; nitride alloys and lateral epitaxy; quantum wells; transport and optical properties; vapor phase epitaxy; extended defects; electronic devices and processing.

    Product details

    No date available
    Hardback
    9781558996298
    890 pages
    229 × 152 × 46 mm
    1.35kg
      Editors
    • John E. Northrup , Palo Alto Research Center, California
    • Jörg Neugebauer , Fritz-Haber-Institut der Max-Planck-Gesellschaft
    • David C. Look , Wright State University, Ohio
    • Shigefusa F. Chichibu , University of Tsukuba, Japan
    • Henning Riechert , Infineon Technologies