Mechanical Behavior of Materials and Structures in Microelectronics

Mechanical Behavior of Materials and Structures in Microelectronics
Robert C. Cammarata, The Johns Hopkins University
Deborah D. L. Chung, State University of New York, Buffalo
Masahiro Jono, Osaka City University, Japan
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
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Table of Contents
- Part I. Metals
- Part II. Organic Materials
- Part III. Semiconductors
- Part IV. Thin Films and Coatings
- Part V. Stress-Strain and Fracture Analyses
- Part VI. Reliability Issues.
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Semyon Vaynan, Morris E. Fine, J. K. Tien, A. I. Attarwala, Yi-Hsin Pao, Kuan-Luen Chen, An-Yu Kuo, Cynthia M. Melton, Susan M. Yarling, Carl J. Raleigh, Wang Chunqing, Qian Yiyu, Jiang Yihong, Tomohiro Uno, K. Tatsumi, K. Mizuno, O. Kitamura, Y. Ohno, Fang Hongyuan, C. P. Wong, A. Bar-Cohen, Devin E. Mix, Mingguang Zhu, D. D. L. Chung, R. R. Lagasse, R. S. Chambers, T. R. Guess, D. J. Plazek, C. Bero, Boon Wong, David C. Sandkulla, Kun Tong, Jeffrey E. Taylor, Richard J. Farris, A. S. Jordan, V. Swaminathan, S. M. Prokes, Jun Ming Hu, Michael Pecht, Donald Barker, Tetsuya Ohashi, Naoyuki Honda, Jeng-Maw Chiou, J. G. Huang, R. J. Jaccodine, J. H. Huang, S. A. Schwarz, C. L. Schwartz, R. Bhat, T. W. Wu, B. S. Berry, W. C. Pritchet, Si Kamakhya P. Ghatak, Badal De, A. Jagota, M. F. Lemon, Y. H. Hu, Tsann Lin, V. Raman, M. Grant Norton, Paul G. Kotlua, Jian Li, Stuart McKernan, Kathryn P. B. Cracknell, C. Barry Carter, James W. Mayer, P. H. Townsend, T. M. Stokich, Jr, B. S. Huber, B. Yost, Che-Yu Li, Bette Bergman-Reuter, Tim Sullivan, Sarah E. Bobbin, J. W. Wagner, R. C. Cammarata, R. R. Kola, G. K. Celler, R. Ramesham, T. Roppel, C. Ellis, H. S. Koo, T. L. Kuo, D. H. Kuo, R. J. Lin, W. H. Lee, P. T. Wu, H. G. Bohn, W. Pill, K.-H. Robrock, W. Schilling, C.-K. Kwok, E. Kolawa, M. A. Nicolet, Ray C. Lee, E. Suhir, W. W. Gerberich, J. E. Angelo, R. R. Keller, A. W. Wowchak, P. I. Cohen, L. B. Freund, K. S. Kim, Masahiro Jono, Atsushi Sugeta, A. Chudnovsky, C. P. Bosnyak, C. S. Chen, Ronald E. Allred, William E. Warren, Guo-Quan Lu, Boris Mogilevsky, Tapan K. Gupta, Hideo Miura, Hiroshi Sakata, Shinji Sakata, J. Marschall, F. Milstein, G. Georgeson, V. Gerrish, David L. Davidson, C. C. Chao, R. Chleboski, E. J. Henderson, C. K. Holmes, J. P. Kalejs, T. S. Gross, M. Muraoka, H. Abé, V. N. Belomestnykh, O. L. Khasanov, Yu.P. Pokholkov, A. A. Bush, Beta Y. Ni, T. Y. Zhang, J. C. M. Li, M. A. Korhonen, P. Børgesen, C. Basa, W. R. LaFontaine, B. Land, J. K. Lee, C. A. Paszkiet, T. Nakagawa, H. Miyatake, T. Maeda, K. Kuroda, N. Tokushige, R. Inoue, J. Kudo, T. Ashida, R. G. Ross, Jr, L. C. Wen, G. R. Mon, E. Jetter, J. Winslow, L. G. Burrell, S. Kapur, I. Shareef, A. M. Conlon, C. P. Cameron, J. W. Lau
- Ephraim Suhir , AT&T Bell Laboratories, New Jersey
- Robert C. Cammarata , The Johns Hopkins University
- Deborah D. L. Chung , State University of New York, Buffalo
- Masahiro Jono , Osaka City University, Japan
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