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Oxide Semiconductors and Thin Films

All titles
Oxide Semiconductors and Thin Films

Oxide Semiconductors and Thin Films

Volume 1494:
André Schleife, Lawrence Livermore National Laboratory, California
Martin Allen, University of Canterbury
Craig B. Arnold, Princeton University, New Jersey
Steven M. Durbin, University at Buffalo, State University of New York
Nini Pryds, Technical University of Denmark, Lyngby
Christof W. Schneider, Paul Scherrer Institute, Villigen, Switzerland
Tim Veal, University of Liverpool
October 2013
1494
Hardback
9781605114712
$88.00
USD
Hardback
    Description

    Symposium Z, 'Oxide Semiconductors', and Symposium F, 'Oxide Thin Films for Renewable Energy Applications', were held November 25–30 at the 2012 MRS Fall Meeting in Boston, Massachusetts. Oxide materials are attracting considerable attention both as semiconductors for a wide range of potential device applications but also in energy research spanning from photo- and electro-catalysis, to electrolytes and electrodes used in batteries or fuel cells. This symposium proceedings volume collects recent reports from the meeting aimed at providing a fundamental understanding of bulk oxide materials as well as thin films and nano-structures. The topics covered in this volume are quite broad and include such areas as growth and doping, defects and characterisation, and device applications.

    Product details

    October 2013
    Hardback
    9781605114712
    318 pages
    235 × 158 × 26 mm
    0.68kg
    266 b/w illus. 25 tables
    Temporarily unavailable - available from TBC

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    Contents

    Table of Contents

    • Part I. ZnO and Related Materials
    • Part II. Non-ZnO Oxides
    • Part III. Devices and Applications.
      • Show more

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    Additional Information
    About the authors
      Contributors

    • Matthew D. McCluskey, Marianne C. Tarun, Samuel T. Teklemichael, Ahmed Souissi, Nadia Hanèche, Corinne Sartel, Abdel Meftah, Alain Lusson, Meherzi Oueslati, Jean-Marie Bluet, Bruno Masenelli, Vincent Sallet, Pierre Galtier, Takuya Matsuo, Shuhei Okuda, Katsuyoshi Washio, R. Baca, M. Galván, J. V. Méndez, J. A. Andraca, R. Peña, S. Lardjane, G. Merad, N. Fenineche, H. I. Faraoun, A. Billard, Ratheesh R. Thankalekshmi, Samwad Dixit, In-Tae Bae, Daniel VanHart, A. C. Rastogi, Akshta Rajan, Kashima Arora, Harish Kumar Yadav, Vinay Gupta, Monika Tomar, Takumi Araki, Jun-ichi Iwata, Hiroshi Katsumata, Christian Franz, Marcel Giar, Markus Heinemann, Michael Czerner, Christian Heiliger, T. Gumprecht, P. Petrik, G. Roeder, M. Schellenberger, L. Pfitzner, B. Pollakowski, B. Beckhoff, MichaÅ‚ A. Borysiewicz, Elżbieta Dynowska, Valery Kolkovsky, Maciej Wielgus, Krystyna GoÅ‚aszewska, Eliana KamiÅ„ska, Marek Ekielski, PrzemysÅ‚aw Struk, Tadeusz Pustelny, Anna Piotrowska, T. N. Oder, A. Smith, M. Freeman, M. McMaster, B. Cai, M. L. Nakarmi, Hiroki Ishizaki, Seishiro Ito, Tien-Chai Lin, Wen-Chang Huang, Chin-Hung Liu, Shang-Chou Chang, Wen-Feng Huang, Chia-Tsung Horng, Shu-Hui Yang, Michael Lorenz, Marius Grundmann, Sandra Wickert, Reinhard Denecke, Sreekanth K. Mahadeva, Zhi-Yong Quan, J. C. Fan, Hasan B. Albargi, Gillian A. Gehring, Anastasia Riazanova, L. Belova, K. V. Rao, Tianyi Zhou, Balaji Raghothamachar, Fangzhen Wu, Michael Dudley, Kanji Yasui, Naoya Yamaguchi, Eichi Nagatomi, Souichi Satomoto, Takahiro Kato, Yutaka Adachi, Naoki Ohashi, Isao Sakaguchi, Hajime Haneda, Kondaiah Paruchuri, Vanjari Sundara Raja, Suda Uthanna, N. Ravi Chandra Raju, Kentaro Kaneko, Kazuaki Akaiwa, Shizuo Fujita, Martin Becker, Angelika Polity, Davar Feili, Bruno K. Meyer, Karsten Wolff, Petri Heljo, Donald Lupo, Daniel Reppin, Sviatoslav Shokhovets, Yan Wang, John F. Muth, Han Wang, Xiaoqiang Jiang, Brian G. Willis, Monica Sorescu, Tianhong Xu, Collin Wade, Avi Shalav, Robert G. Elliman, Masafumi Chiba, Daisuke Endo, Kenichi Haruta, Hideki Kimura, Hideo Kiyota, Sachindra Nath Sarangi, Dongyuan Zhang, Pratap Kumar Sahoo, Kazuo Uchida, Surendra Nath Sahu, Shinji Nozaki, Jeff Spiegelman, Dan Alvarez, Russell J. Holmes, Ed Heinlein, Zohreh Shamsi, Akifumi Matsuda, Takuya Aoyagi, Takashi Naito, Tadashi Fujieda, Kenjiro Ikejiri, Koji Koyama, Ryosuke Yamauchi, Geng Tan, Satoru Kaneko, Mamoru Yoshimoto, Norihiro Suzuki, K. Sakurai, T. Hanawa, N. Kikuchi, K. Nishio, K. Tonooka, R. Wang, H. Bando, H. Takashima, Ayushi Paliwal, M. Nazari, Y. Zhao, Y. Zhu, V. V. Kuryatkov, A. A. Bernussi, Z. Fan, M. Holtz, A. V. Adedeji, S. D. Worsley, T. L. Baker, R. Mundle, A. K. Pradhan, A. C. Ahyi, T. Isaacs-Smith, Dan Jiang, Songwei Han, Xuelian Zhao, Jinrong Cheng, Kee-Chul Chang, Brian J. Ingram, E. Mitchell Hopper, Miaolei Yan, Paul Salvador, Hoydoo You, K. Armstrong, T. M. Dinh, D. Pech, M. Brunet, J. Gaudet, D. Guay, Matthew Chamberlin, Renee E. Ahern, Costel Constantin, M. Rekow, T. Panarello, W. S. Sampath, T. Shiraishi, H. Einishi, M. Ishikawa, T. Hasegawa, M. Kurosawa, H. Funakubo, Gerardo Gutierrez-Heredia, Israel Mejia, Norberto Hernandez-Como, Martha E. Rivas-Aguilar, Victor H. Martinez-Landeros, Francisco S. Aguirre-Tostado, Bruce E. Gnade, Manuel Quevedo, Ramsey Kraya, Laura Y. Kraya

      • Editors
    • André Schleife , Lawrence Livermore National Laboratory, California
    • Martin Allen , University of Canterbury
    • Craig B. Arnold , Princeton University, New Jersey
    • Steven M. Durbin , University at Buffalo, State University of New York
    • Nini Pryds , Technical University of Denmark, Lyngby
    • Christof W. Schneider , Paul Scherrer Institute, Villigen, Switzerland
    • Tim Veal , University of Liverpool

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