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Materials, Integration and Packaging Issues for High-Frequency Devices

Materials, Integration and Packaging Issues for High-Frequency Devices

Materials, Integration and Packaging Issues for High-Frequency Devices

Volume 783:
P. Muralt, Swiss Federal Institute of Technology, Lausanne
Y. S. Cho, DuPont Electronic Technologies, North Carolina
M. Klee, Philips Research Laboratories, Germany
J. -P. Maria, North Carolina State University
C. A. Randall, Pennsylvania State University
Ch. Hoffmann, EPCOS OHG, Austria
June 2014
783
Paperback
9781107409361
$35.99
USD
Paperback
Hardback

    This book, first published in 2004, focuses on the materials technologies that are key to the advancement of high-frequency devices. The competition for better-performing mobile phones is the main driving factor in this field. In mobile phones, passive components constitute 70-90% of the number of components, volume, and costs. The spirit of the volume is to bring together scientists in the processing, characterization, packaging, device design and applications of passive devices, to gain insight into the various paths along which technology of passive components is progressing. Topics include: improvements in low-temperature co-fired ceramics; microstructure - property relationships in perovskites for new materials compositions, with lower firing temperatures, for microwave dielectrics with high-quality factors; tunable ferroelectrics allowing low-cost solutions for frequency tuning and phase shifters; new integration platforms and packaging concepts; embedded capacitors; integration of RF switches based on MEMS technology; bulk acoustic wave resonators and above-chip integration.

    Product details

    June 2014
    Paperback
    9781107409361
    250 pages
    229 × 152 × 13 mm
    0.34kg
    Available
      Editors
    • P. Muralt , Swiss Federal Institute of Technology, Lausanne
    • Y. S. Cho , DuPont Electronic Technologies, North Carolina
    • M. Klee , Philips Research Laboratories, Germany
    • J. -P. Maria , North Carolina State University
    • C. A. Randall , Pennsylvania State University
    • Ch. Hoffmann , EPCOS OHG, Austria