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Ferroelectric Thin Films VII

Ferroelectric Thin Films VII

Ferroelectric Thin Films VII

Volume 541:
Robert E. Jones, Motorola, Austin, Texas
Robert W. Schwartz, Clemson University, South Carolina
Scott R. Summerfelt, Texas Instruments Inc., Texas
In K. Yoo, Samsung Advanced Institute of Technology, Korea
June 2014
541
Paperback
9781107413795
Out of Print
Paperback
Hardback

    This book, first published in 1999, presents the technical information on ferroelectric thin films from an international array of academia, government organizations and industry. The results in DRAM and FERAM devices, as well as enhancements in materials performance for these applications are reported. Advances in integration issues are also discussed, including electrode technologies, annealing procedures, and fabrication methods. The development of ferroelectric thin films for piezoelectric, pyroelectric and optical applications is reviewed. And improved film fabrication procedures, including chemical vapor deposition and chemical solution deposition, are featured. Topics include: BST and DRAM; integration and electrodes; bilayered ferroelectrics; Pb-based ferroelectrics; fundamental material properties and superlattices; ferroelectric gate materials and devices; piezoelectric, electrostrictive, pyroelectric and giant magnetoresistive materials; and ferroelectrics for microwave and optical applications.

    Product details

    June 2014
    Paperback
    9781107413795
    792 pages
    229 × 152 × 40 mm
    1.04kg
    Unavailable - out of print
      Editors
    • Robert E. Jones , Motorola, Austin, Texas
    • Robert W. Schwartz , Clemson University, South Carolina
    • Scott R. Summerfelt , Texas Instruments Inc., Texas
    • In K. Yoo , Samsung Advanced Institute of Technology, Korea