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Nitride Semiconductors

Nitride Semiconductors

Nitride Semiconductors

Volume 482:
F. A. Ponce, Xerox Palo Alto Research Center, Stanford University, California
S. P. DenBaars, University of California, Santa Barbara
B. K. Meyer, Justus-Liebig-Universität Giessen, Germany
S. Nakamura, Nichia Chemical Industries, Anan, Tokushima
S. Strite, IBM Research Laboratory, Zurich
April 1998
482
Out of stock in print form with no current plan to reprint
Hardback
9781558993877
CAD$43.95
Hardback

    This book is on recent experimental and theoretical progress in the rapidly growing field of III-V nitrides. Issues related to crystal growth (bulk and thin films), structure and microstructure, formation of defects, doping, alloying, formation of heterostructures, determination of physical properties and device fabrication and evaluation are addressed. Papers show much progress in the growth and understanding of III-V nitrides and in the production of optoelectronic devices based on these materials. Most exciting is the fact that light-emitting diodes and laser diodes have now reached amazing levels of performance which forecasts a revolution in lighting, optical storage, printing, and display technologies. Topics include: crystal growth- bulk growth, early stages of epitaxy; crystal growth- MOCVD; growth techniques - MBE and HVPE; novel substrates and growth techniques; structural properties; electronic properties; luminescence and recombination; characterization, elemental and stress analysis; physical modelling; device processing, implantation, annealing; device characterization, contacts, degradation; and injection laser diodes and applications.

    Product details

    April 1998
    Hardback
    9781558993877
    1224 pages
    1.818kg
    Out of stock in print form with no current plan to reprint
      Editors
    • F. A. Ponce , Xerox Palo Alto Research Center, Stanford University, California
    • S. P. DenBaars , University of California, Santa Barbara
    • B. K. Meyer , Justus-Liebig-Universität Giessen, Germany
    • S. Nakamura , Nichia Chemical Industries, Anan, Tokushima
    • S. Strite , IBM Research Laboratory, Zurich