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Hydrogenated Amorphous Silicon

Hydrogenated Amorphous Silicon

Hydrogenated Amorphous Silicon

R. A. Street, Xerox Palo Alto Research Center, Stanford University, California
September 2005
Available
Paperback
9780521019347

    Divided roughly into two parts, the book describes the physical properties and device applications of hydrogenated amorphous silicon. The first section is concerned with the atomic and electronic structure, and covers growth defects and doping and defect reactions. The emphasis is on the optical and electronic properties that result from the disordered structure. The second part of the book describes electronic conduction, recombination, interfaces, and multilayers. The special attribute of a-Si:H which makes it useful is the ability to deposit the material inexpensively over large areas, while retaining good semiconducting properties, and the final chapter discusses various applications and devices.

    Reviews & endorsements

    "...highly recommended to people entering the field professionally and to those who need an overview of the research so far." Andrew Holmes-Siedle, Nature

    See more reviews

    Product details

    September 2005
    Paperback
    9780521019347
    432 pages
    217 × 140 × 25 mm
    0.572kg
    Available

    Table of Contents

    • 1. Introduction
    • 2. Growth and structure of amorphous silicon
    • 3. The electronic density of states
    • 4. Defects and their electronic states
    • 5. Substitutional doping
    • 6. Defect reactions, thermal equilibrium and metastability
    • 7. Electronic transport
    • 8. Recombination of excess carriers
    • 9. Contacts, interfaces and multilayers
    • 10. Amorphous silicon device technology.
      Author
    • R. A. Street , Xerox Palo Alto Research Center, Stanford University, California