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Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing

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Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing

Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing

Volume 146:
David Hodul, Varian Research Center, Palo Alto, California
Jeffrey C. Gelpey, Peak Systems, Inc., Saugus, Massachusetts
Martin L. Green, AT&T Bell Laboratories, New Jersey
Thomas E. Seidel, Sematech, Austin, Texas
No date available
146
Paperback
9781107410756
Paperback
    Description

    Product details

    No date available
    Hardback
    9781558990197
    520 pages
    229 × 29 × 152 mm
    0.86kg

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      Editors
    • David Hodul , Varian Research Center, Palo Alto, California
    • Jeffrey C. Gelpey , Peak Systems, Inc., Saugus, Massachusetts
    • Martin L. Green , AT&T Bell Laboratories, New Jersey
    • Thomas E. Seidel , Sematech, Austin, Texas

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