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Thin Films for Optical Waveguide Devices and Materials for Optical Limiting

Thin Films for Optical Waveguide Devices and Materials for Optical Limiting

Thin Films for Optical Waveguide Devices and Materials for Optical Limiting

Volume 597:
Keiichi Nashimoto, Fuji Xerox Co. Ltd., Japan
Ruth Pachter, Air Force Research Laboratory, U.S.A.
Bruce W. Wessels, Northwestern University, Illinois
Joseph Shmulovich, Lucent Technologies, New Jersey
Alex -K. -Y. Jen, University of Washington
Keith Lewis, Defence Evaluation and Research Agency, Worcestershire
Richard Sutherland, Science Applications International Corp.
Joseph W. Perry, University of Arizona
October 2000
597
Hardback
9781558995055
Out of Print
Hardback
Paperback

    This book, first published in 2000, provides a multidisciplinary discussion of the science and technology of optical materials and devices for materials scientists, chemists, and physicists. Symposium Z, Thin Films for Optical Waveguide Devices, covers materials properties, thin-film processing and optical waveguide device integration. The range of thin films include ferroelectrics, dielectrics, glasses, and polymers with epitaxial, glass, or polymeric structures. Discussions of thin-film processing include sputtering, MBE, PLD, MOCVD, FHD, sol-gel, and spin casting for luminescent waveguides, electro-optic waveguides, magneto-optic waveguides, and photonic crystals. Symposium PP, Materials for Optical Limiting II, addresses the development of materials for optical limiters and tunable filters which can suppress undesired radiation. Topics include two-photon absorbers and photorefractives, as well as continued emphasis on reverse saturable absorption, liquid crystals, and carbon-based suspensions. It also covers new materials modeling and synthesis, nonlinear materials characterization, device applications using new materials and analyses of materials impact on optical limiting applications.

    Product details

    October 2000
    Hardback
    9781558995055
    488 pages
    229 × 152 × 27 mm
    0.82kg
    Unavailable - out of print
      Editors
    • Keiichi Nashimoto , Fuji Xerox Co. Ltd., Japan
    • Ruth Pachter , Air Force Research Laboratory, U.S.A.
    • Bruce W. Wessels , Northwestern University, Illinois
    • Joseph Shmulovich , Lucent Technologies, New Jersey
    • Alex -K. -Y. Jen , University of Washington
    • Keith Lewis , Defence Evaluation and Research Agency, Worcestershire
    • Richard Sutherland , Science Applications International Corp.
    • Joseph W. Perry , University of Arizona