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Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing

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Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing

Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing

Volume 146:
David Hodul, Varian Research Center, Palo Alto, California
Jeffrey C. Gelpey, Peak Systems, Inc., Saugus, Massachusetts
Martin L. Green, AT&T Bell Laboratories, New Jersey
Thomas E. Seidel, Sematech, Austin, Texas
June 2014
146
Unavailable - out of print
Paperback
9781107410756
Out of Print
Paperback
Hardback
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    June 2014
    Paperback
    9781107410756
    518 pages
    229 × 152 × 26 mm
    0.69kg
    Unavailable - out of print

    Often bought together

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    • David Hodul , Varian Research Center, Palo Alto, California
    • Jeffrey C. Gelpey , Peak Systems, Inc., Saugus, Massachusetts
    • Martin L. Green , AT&T Bell Laboratories, New Jersey
    • Thomas E. Seidel , Sematech, Austin, Texas

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