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Polycrystalline Thin Films — Structure, Texture, Properties III

Polycrystalline Thin Films — Structure, Texture, Properties III

Polycrystalline Thin Films — Structure, Texture, Properties III

Volume 472:
Brent L. Adams, Carnegie Mellon University, Pennsylvania
Fu-Rong Chen, National Tsing Hua University, Taiwan
James S. Im, Columbia University, New York
Steven M. Yalisove, University of Michigan, Ann Arbor
Yimei Zhu, Brookhaven National Laboratory, New York
November 1997
472
Out of stock in print form with no current plan to reprint
Hardback
9781558993761
£22.99
GBP
Hardback

    Thin films are used in virtually every manufacturing and technological area. A large fraction of these films are polycrystalline. Their uses range from critical components in the microelectronics industry, to hard coatings for wear resistance, corrosion resistance and thermal barriers, to magnetic, optical and medical applications. It is essential to the functional properties of these films that the microstructure, composition, architecture and stress state be produced with a high level of control which demands a detailed understanding of the mechanisms which are responsible for the formation of structure in polycrystalline thin films. This book focuses on thin polycrystalline metallic, ceramic and semiconducting films of thicknesses in the range of tens to thousands of nanometers. Topics range from fundamental to technological. Topics include: evolution of texture and microstructure; grain boundaries and interfaces; microstructure, stress and texture; characterization and representation; microstructure, texture and reliability; processing, characterization and application and polycrystalline Si and SiGe films.

    Product details

    November 1997
    Hardback
    9781558993761
    474 pages
    0.841kg
    Out of stock in print form with no current plan to reprint
      Editors
    • Brent L. Adams , Carnegie Mellon University, Pennsylvania
    • Fu-Rong Chen , National Tsing Hua University, Taiwan
    • James S. Im , Columbia University, New York
    • Steven M. Yalisove , University of Michigan, Ann Arbor
    • Yimei Zhu , Brookhaven National Laboratory, New York