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Polycrystalline Metal and Magnetic Thin Films

Polycrystalline Metal and Magnetic Thin Films

Polycrystalline Metal and Magnetic Thin Films

Volume 562:
David E. Laughlin, Carnegie Mellon University, Pennsylvania
Kenneth P. Rodbell, IBM T J Watson Research Center, New York
Olivier Thomas, Université d'Aix-Marseille
Bing Zhang, MMC Technology, California
June 2014
562
Unavailable - out of print
Paperback
9781107413986
Out of Print
Paperback
Hardback

    The unprecedented growth in the semiconductor, electronics and storage industries is the result of continued miniaturization of circuit devices, increases in chip functionality, and increased storage capacity and performance, along with a decrease in per-function cost. Hardware shrinkage has taken place, leading to similar decreases in the dimensions of interconnection wires, contact metallization and magnetic storage footprints. The increasingly important role of surfaces, interfaces, defects and impurities has raised serious materials questions about how to control the properties of polycrystalline thin films used in applications requiring tight performance tolerances. The understanding of polycrystalline film structures during growth, and the evolution of various film properties with time and temperature, is critical to the successful design and development of smaller devices. This book, first published in 1999, highlights the directions taken to understand and control the properties of polycrystalline materials. Topics include: magnetic thin films; microstructure, texture and stress; copper microstructure; nanocrystalline magnetic thin films and thin-film permanent magnets.

    Product details

    June 2014
    Paperback
    9781107413986
    366 pages
    229 × 152 × 19 mm
    0.49kg
    Unavailable - out of print
      Editors
    • David E. Laughlin , Carnegie Mellon University, Pennsylvania
    • Kenneth P. Rodbell , IBM T J Watson Research Center, New York
    • Olivier Thomas , Université d'Aix-Marseille
    • Bing Zhang , MMC Technology, California