Electromigration in Metals
Electromigration in Metals
Chao-Kun Hu, IBM T J Watson Research Center, New York
Martin Gall, GlobalFoundries
Valeriy Sukharev, Siemens Business
£74.99
GBPLearn to assess electromigration reliability and design more resilient chips in this comprehensive and practical resource. Beginning with fundamental physics and building to advanced methodologies, this book enables the reader to develop highly reliable on-chip wiring stacks and power grids. Through a detailed review on the role of microstructure, interfaces and processing on electromigration reliability, as well as characterisation, testing and analysis, the book follows the development of on-chip interconnects from microscale to nanoscale. Practical modeling methodologies for statistical analysis, from simple 1D approximation to complex 3D description, can be used for step-by-step development of reliable on-chip wiring stacks and industrial-grade power/ground grids. This is an ideal resource for materials scientists and reliability and chip design engineers.
- Provides a comprehensive review of the topic, building up from fundamental physics to applications
- Explains methodologies for statistical analysis, from simple 1D to complex 3D models, which can be used for step-by-step development
- Utilises a multidisciplinary approach to explain electromigration as a physical phenomenon and its role as a major challenge in chip reliability
Reviews & endorsements
'… useful for graduate students in materials science and mechanical or electrical engineering … Recommended.' J. Lambropoulos, Choice
Product details
May 2022Hardback
9781107032385
430 pages
250 × 174 × 24 mm
0.98kg
Available
Table of Contents
- 1. Introduction to electromigration
- 2. Fundamentals of electromigration
- 3. Thermal stress characteristics and stress induced void formation in aluminium and copper interconnects
- 4. Stress evolution and damage formation in confined metal lines under electric stressing
- 5. Electromigration in Cu interconnect structures
- 6. Scaling effects on microstructure and resistivity of Cu and Co nanointerconnects
- Analysis of electromigration induced stress evolution and voiding in Cu damascene lines with microstructure
- 8. Massive scale statistical studies for electromigration
- 9. Assessment of electromigration damage in large on-chip power grids. Index.
