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Chemical Vapor Deposition of Refractory Metals and Ceramics III

Chemical Vapor Deposition of Refractory Metals and Ceramics III

Chemical Vapor Deposition of Refractory Metals and Ceramics III

Volume 363:
Bernard M. Gallois, Stevens Institute of Technology, New Jersey
Woo Y. Lee, Oak Ridge National Laboratory
Michael A. Pickering, Morton International, Woburn, Massachusetts
April 1995
363
Out of stock in print form with no current plan to reprint
Hardback
9781558992641
£22.99
GBP
Hardback

    CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), “smart” material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.

    Product details

    April 1995
    Hardback
    9781558992641
    283 pages
    0.591kg
    Out of stock in print form with no current plan to reprint
      Editors
    • Bernard M. Gallois , Stevens Institute of Technology, New Jersey
    • Woo Y. Lee , Oak Ridge National Laboratory
    • Michael A. Pickering , Morton International, Woburn, Massachusetts