Characterization of Plasma-Enhanced CVD Processes

Characterization of Plasma-Enhanced CVD Processes
Volume 165:
Gerald Lucovsky, North Carolina State University
Dale E. Ibbotson, AT&T Bell Laboratories, New Jersey
Dennis W. Hess, University of California, Berkeley
Dale E. Ibbotson, AT&T Bell Laboratories, New Jersey
Dennis W. Hess, University of California, Berkeley
September 1990
165
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9781558990531
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September 1990Hardback
9781558990531
270 pages
229 × 152 × 16 mm
0.53kg
Temporarily unavailable - available from TBC
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SiO2 and its Interfaces
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- Gerald Lucovsky , North Carolina State University
- Dale E. Ibbotson , AT&T Bell Laboratories, New Jersey
- Dennis W. Hess , University of California, Berkeley
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