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Applications of Synchrotron Radiation Techniques to Materials Science II

Applications of Synchrotron Radiation Techniques to Materials Science II

Applications of Synchrotron Radiation Techniques to Materials Science II

Volume 375:
Kevin L. D'Amico, X-ray Analytics, Ltd. Hinsdale, Illinois
Gene E. Ice, Oak Ridge National Laboratory
Dale L. Perry, Lawrence Berkeley Laboratory, Berkeley
Neal D. Shinn, Sandia National Laboratories, Albuquerque
Louis J. Terminello, Lawrence Livermore National Laboratory, California
March 1995
375
Out of stock in print form with no current plan to reprint
Hardback
9781558992771
£22.99
GBP
Hardback

    Volume I in this series promised that the advent of third-generation light sources would enhance synchrotron-based materials research. This second volume fulfills the promise, featuring many experiments that required newer, higher-brightness sources, and could not have been performed with earlier vintage synchrotrons. The book focuses on the characterization of reduced dimensional systems, and highlights studies of surfaces, interfaces, polymers, glasses, thin films, magnetic materials, metal systems, multilayers and electronic materials. Topics include: thin films; magnetic materials; surfaces, clusters, quantum systems, and methods; interfaces (solid/solid, solid/liquid); layered compounds, alloys and novel materials; and microprobe, tomography and microscopy.

    Product details

    March 1995
    Hardback
    9781558992771
    335 pages
    230 × 156 mm
    0.659kg
    Out of stock in print form with no current plan to reprint
      Editors
    • Kevin L. D'Amico , X-ray Analytics, Ltd. Hinsdale, Illinois
    • Gene E. Ice , Oak Ridge National Laboratory
    • Dale L. Perry , Lawrence Berkeley Laboratory, Berkeley
    • Neal D. Shinn , Sandia National Laboratories, Albuquerque
    • Louis J. Terminello , Lawrence Livermore National Laboratory, California