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Amorphous and Heterogeneous Silicon-Based Films – 2002

Amorphous and Heterogeneous Silicon-Based Films – 2002

Amorphous and Heterogeneous Silicon-Based Films – 2002

Volume 715:
J. David Cohen, University of Oregon
John R. Abelson, University of Illinois, Urbana-Champaign
Hideki Matsumura, Japan Advanced Institute of Scienc and Technology
John Robertson, University of Cambridge
June 2014
715
Unavailable - out of print
Paperback
9781107411944
Out of Print
Paperback
Hardback

    This book on amorphous silicon technology shows a trend towards technologies based on amorphous and heterogeneous silicon (solar cells, TFTs, imaging arrays, sensors, etc.) and brings together researchers from around the world to share their expanding expertise. The book contains eleven chapters and focuses on basic mechanisms of growth (as well as new approaches to film growth); hot wire, CVD-produced amorphous and microcrystalline films and related subjects of film crystallization and recrystallization; the electronic structure and transport properties of silicon-based thin films are discussed, together with hydrogen microstructure and metastability. Silicon nitride, four on alloys with germanium, and two dealing predominantly with silicon carbide are looked at. There is also focus on photovoltaic devices based on either amorphous or microcrystalline (or mixed phase) materials. It also offers a look at thin-film transistors, as well as related types of imaging and sensing arrays and there are papers on novel device structures and new types of technologies being developed using amorphous/heterogeneous thin film, silicon-based materials.

    Product details

    June 2014
    Paperback
    9781107411944
    830 pages
    229 × 152 × 42 mm
    1.09kg
    Unavailable - out of print
      Editors
    • J. David Cohen , University of Oregon
    • John R. Abelson , University of Illinois, Urbana-Champaign
    • Hideki Matsumura , Japan Advanced Institute of Scienc and Technology
    • John Robertson , University of Cambridge