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Advances in Microcrystalline and Nanocrystalline

Advances in Microcrystalline and Nanocrystalline

Advances in Microcrystalline and Nanocrystalline

Volume 452:
Robert W. Collins, Pennsylvania State University
Philippe M. Fauchet, University of Rochester, New York
A. Paul Alivisatos, University of California, Berkeley
Toshikazu Shimada, Hitachi Ltd, Tokyo
Isamu Shimizu, Tokyo Institute of Technology
Jean-Claude Vial, Université Joseph Fourier, Grenoble
March 1997
452
Out of stock in print form with no current plan to reprint
Hardback
9781558993563
£22.99
GBP
Hardback

    This book brings together scientists and engineers with diverse backgrounds to share their recent advances in the preparation, characterization and theoretical modelling of microcrystalline and nanocrystalline semiconductors whose properties are influenced by size and boundary effects. Topics include: current status and future prospects of research in microcrystalline and nano-crystalline semiconductors; theory of semiconductor clusters, nanocrystals and porous silicon; synthesis and properties of luminescent Group IV clusters, nanocrystals and nanostructures; synthesis and properties of other Group IV clusters, nanocrystals and nanostructures; Groups III-V and II-VI, and metal sulfide, iodide, and oxide nanocrystals and nanostructures; synthesis, surfaces and structure/property relations of luminescent porous semiconductors; photoluminescence and other optical properties of porous silicon; biochemical, photochemical, photoelectronic, and optical device applications of nanocrystal and porous semiconductors; electroluminescence and light-emitting devices of nanocrystal and porous silicon; preparation, properties and applications of nanocrystalline, microcrystalline and microstructured thin films together with polycrystalline silicon and other crystalline systems.

    Product details

    March 1997
    Hardback
    9781558993563
    1060 pages
    240 × 160 mm
    1.591kg
    Out of stock in print form with no current plan to reprint
      Editors
    • Robert W. Collins , Pennsylvania State University
    • Philippe M. Fauchet , University of Rochester, New York
    • A. Paul Alivisatos , University of California, Berkeley
    • Toshikazu Shimada , Hitachi Ltd, Tokyo
    • Isamu Shimizu , Tokyo Institute of Technology
    • Jean-Claude Vial , Université Joseph Fourier, Grenoble